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2016

Photosensitive polyimide-silicone copolymer based on reaction development patterning (RDP)

Oyama, T., Kasahara, A., Yasuda, M. & Takahashi, A. 2016 In : Journal of Photopolymer Science and Technology. 29, 2, p. 273-276 4 p.

Research output: Contribution to journalArticle

Polyimides
Silicones
Copolymers
Soldering alloys
Liquids
Epoxy resins
Printed circuit boards
Resins
Epoxy resins
Ethers
Semiconductor devices
Silicon carbide
Thermodynamic stability
2015
1 Citations

A study on positive photosensitive epoxy resins using reaction development patterning (RDP)

Zhou, W. M., Fukushima, T., Tomoi, M. & Oyama, T. 2015 Jan 28 In : Journal of Photopolymer Science and Technology. 27, 6, p. 713-717 5 p.

Research output: Contribution to journalArticle

Epoxy resins
Curing
Polymers
Ethanolamines
Thermal stress
1 Citations

Photosensitive poly(vinylene carbonate)s based on reaction development patterning with dilute aqueous alkaline solution

Suzuki, M. & Oyama, T. 2015 Nov 1 In : Polymer International. 64, 11, p. 1560-1567 8 p.

Research output: Contribution to journalArticle

Carbonates
Copolymers
Homopolymerization
Hydrolysis
Polymers

Preparation of poly(1,2-dihydroxyethylene-co-vinyl alcohol)s as polymer homologues of methanol/ethanol

Suzuki, M., Takahashi, A. & Oyama, T. 2015 In : Chemistry Letters. 44, 5, p. 671-673 3 p.

Research output: Contribution to journalArticle

alcohol
methanol
ethanol
polymer
acid
1 Citations

Utilization of polyarylates having chemically introduced diazonaphthoquinone structure for reaction development patterning

Oyama, T., Shimada, N. & Takahashi, A. 2015 Aug 19 In : Journal of Photopolymer Science and Technology. 28, 2, p. 219-227 9 p.

Research output: Contribution to journalArticle

Molecular weight
Mechanical properties
Polycondensation
Crosslinking
Thermodynamic properties
2014
4 Citations

Addition of photosensitivity to hyperbranched engineering plastics based on reaction development patterning

Kawada, T., Takahashi, A. & Oyama, T. 2014 In : Journal of Photopolymer Science and Technology. 27, 2, p. 219-222 4 p.

Research output: Contribution to journalArticle

Nuclear magnetic resonance
Acids
Polymers
Photosensitivity
Esters

Toward realization of the research that can be easily recognized as my works

Oyama, T. 2014 Jan 1 In : Kobunshi. 63, 1, p. 13-14 2 p.

Research output: Contribution to journalArticle

Polymers
Thermosets
Polypeptides
Toughening
Power generation
2013
6 Citations

Development of photosensitive alicyclic polyimides based on reaction development patterning

Yasuda, M., Takahashi, A. & Oyama, T. 2013 Aug 27 In : Journal of Photopolymer Science and Technology. 26, 3, p. 357-360 4 p.

Research output: Contribution to journalArticle

Polyimides
2012

Addition of photosensitivity to engineering plastics utilizing polymer reaction: Reaction development patterning

Oyama, T. 2012 Nov In : Kobunshi. 61, 11, p. 877-878 2 p.

Research output: Contribution to journalArticle

Polymers
Polyimides
Plastics
Photosensitivity
Nucleophiles

A novel mechanism to give photosensitivity to engineering plastics: Reaction development patterning

Oyama, T. 2012 Dec 1 Proceedings of the International Display Workshops. Vol. 1, p. 509-512 4 p.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Photosensitivity
Polyimides
Plastics
Polyetherimides
Nucleophiles
6 Citations

Development of photosensitive vinyl polymers with imide group based on reaction development patterning

Sakii, D., Takahashi, A. & Oyama, T. 2012 Oct 30 In : Journal of Photopolymer Science and Technology. 25, 3, p. 371-374 4 p.

Research output: Contribution to journalArticle

Polymers
2011
2 Citations

Curing behavior and thermal mechanical properties of epoxy resins containing polyaromatic backbones

Ohnishi, Y., Oyama, T. & Takahashi, A. 2011 Feb 1 In : Kobunshi Ronbunshu. 68, 2, p. 62-71 10 p.

Research output: Contribution to journalArticle

resin
thermal expansion
naphthalene
boron
stacking
11 Citations

Development of high-performance epoxy/clay nanocomposites by incorporating novel phosphonium modified montmorillonite

Saitoh, K., Ohashi, K., Oyama, T., Takahashi, A., Kadota, J., Hirano, H. & Hasegawa, K. 2011 Oct 5 In : Journal of Applied Polymer Science. 122, 1, p. 666-675 10 p.

Research output: Contribution to journalArticle

Clay
Nanocomposites
Positive ions
Organoclay
Epoxy resins
7 Citations

Photosensitive sulfonated polyimides utilizing alkaline-developable negative-tone reaction development patterning

Kasahara, A., Takahashi, A. & Oyama, T. 2011 Aug 18 In : Journal of Photopolymer Science and Technology. 24, 3, p. 269-272 4 p.

Research output: Contribution to journalArticle

Polyimides
5 Citations

Positive-tone pattern formation from vinyl polymers with maleimide group by reaction development patterning

Oyama, T., Senoo, S., Tomoi, M. & Takahashi, A. 2011 Sep 28 In : Journal of Photopolymer Science and Technology. 24, 5, p. 523-526 4 p.

Research output: Contribution to journalArticle

Polymers

Study on polybenzoxazine modified with epoxy resin

Kagawa, M., Oyama, T. & Takahashi, A. 2011 May 1 In : Journal of Japan Institute of Electronics Packaging. 14, 3, p. 204-211 8 p.

Research output: Contribution to journalArticle

Epoxy resins
Thermodynamic properties
Thermosets
Ring opening polymerization
Liquid crystals
2010
1 Citations
plastic
engineering
polymer
carboxylic acid
functional group
1 Citations

Application of biomass-derived lignophenol to epoxy resins

Tsuda, S., Oyama, T., Takahashi, A., Okabe, Y., Kaoawa, H., Yamada, S. & Okabe, Y. 2010 Sep 1 In : Kobunshi Ronbunshu. 67, 9, p. 497-505 9 p.

Research output: Contribution to journalArticle

resin
biomass
bromide
ether
phenol
8 Citations

Development of chemically amplified reaction development patterning

Cheng, X., Takahashi, A. & Oyama, T. 2010 Jan 1 In : Polymer Journal. 42, 1, p. 86-94 9 p.

Research output: Contribution to journalArticle

Acids
Polyetherimides
Carboxylic acids
Esters
Alcohols
1 Citations

Development of novel engineering plastics based on reaction development patterning

Oyama, T. 2010 Aug 1 In : Kobunshi Ronbunshu. 67, 8, p. 477-488 12 p.

Research output: Contribution to journalArticle

plastic
engineering
polymer
carboxylic acid
ester
8 Citations

Development of thermostable photosensitive polycarbonates based on negative-tone reaction development patterning

Yasuda, S., Takahashi, A., Oyama, T. & Yamao, S. 2010 Oct 1 In : Journal of Photopolymer Science and Technology. 23, 4, p. 511-514 4 p.

Research output: Contribution to journalArticle

Polycarbonates
9 Citations
Polyimides
2009
15 Citations

A novel mechanism to afford photosensitivlty to unfunctionalized polyimides: Negative-tone reaction development patterning

Oyama, T., Sugawara, S., Shimizu, Y., Cheng, X., Tomoi, M. & Takahashi, A. 2009 Sep 1 In : Journal of Photopolymer Science and Technology. 22, 5, p. 597-602 6 p.

Research output: Contribution to journalArticle

Polyetherimides
Dissolution
Acids
Mercury vapor lamps
Photomasks
12 Citations

Examination of pattern-forming conditions in negative-tone reaction development patterning

Shimizu, Y., Takahashi, A. & Oyama, T. 2009 In : Journal of Photopolymer Science and Technology. 22, 3, p. 407-410 4 p.

Research output: Contribution to journalArticle

Toughening of amine-cured epoxy resins by in situ generated poly (benzyl methacrylate)

Shinozaki, H., Oyama, T. & Takahashi, A. 2009 Jun 1 In : Kobunshi Ronbunshu. 66, 6, p. 217-224 8 p.

Research output: Contribution to journalArticle

resin
matrix
ethylene
polymer
fracture toughness
2008
1 Citations

Toughening of epoxy resin by modification with poly[poly(N-phenylmaleimide-alt-styrene)-graft-polyethylene oxide] prepared by in situ polymerization

Misumi, J., Oyama, T., Tomoi, M. & Takahashi, A. 2008 Sep 1 In : Kobunshi Ronbunshu. 65, 9, p. 562-572 11 p.

Research output: Contribution to journalArticle

resin
oxide
fracture toughness
polymerization
ethylene