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Research Output 1984 2011

  • 140 Citations
  • 6 h-Index
  • 27 Article
  • 7 Conference contribution
  • 1 Chapter
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Conference contribution
2010

Analysis of the electrorefractive effect in Ge/SiGe coupled quantum well for silicon based optical modulators

Iseri, Y., Yamada, H., Arakawa, T., Tada, K. & Haneji, N. 2010 Nov 29 Technical Digest - 15th OptoElectronics and Communications Conference, OECC2010. p. 678-679 2 p. 5588387

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Light modulators
Semiconductor quantum wells
Phase modulation
Modulators
Mach number
2009

Proposal of Ge/SiGe five-layer asymmetric coupled quantum well for mach-zehnder modulators

Iseri, Y., Arakawa, T., Tada, K. & Haneji, N. 2009 Dec 29 Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS. p. 307-308 2 p. 5343248

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Semiconductor quantum wells
Light modulators
Phase modulation
Modulators
Mach number
2004

Electron cyclotron resonance-reactive ion etching of GaN by cyclic injection of CH 4/H 2/Ar and O 2 with constant Ar flow for high etch rate and improvement of etched surface morphology

Awa, Y., Ide, T., Arakawa, T., Haneji, N., Tada, K., Sugiyama, M., Shimizu, H., Shimogaki, Y. & Nakano, Y. 2004 Dec 1 Digest of Papers - Microprocesses and Nanotechnology 2004. p. 280-281 2 p. 28P-7-22

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Electron cyclotron resonance
Reactive ion etching
Etching
Organic chemicals
Sapphire

Preparation and characterization of a-C: F film using low-global warming potential gas by PECVD

Watanabe, H., Tokimitsu, T., Shiga, J., Haneji, N. & Shimogaki, Y. 2004 Advanced Metallization Conference (AMC). Erb, D., Ramm, P., Masu, K. & Osaki, A. (eds.). p. 443-450 8 p.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Polarization
Thermodynamic stability
Permittivity
Plasmas
Gases
2003

Electron cyclotron resonance-reactive ion etching of InGaAs/InAlAs/InP multilayer structure and GaN by cyclic injection of CH4/H2/Ar and O2 with constant Ar flow

Haneji, N., Ide, T., Awa, Y., Arakawa, T., Tada, K., Sugiyama, M., Shimogaki, Y. & Nakano, Y. 2003 Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc., p. 330-331 2 p. 1268780

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Etching
Multilayers
Electron cyclotron resonance
Light modulators
Reactive ion etching

Residence time effect on the properties of low-k a-C: F films by PECVD

Tokimitsu, T., Watanable, H., Shinga, J., Okamoto, T., Haneji, N. & Shimogaki, Y. 2003 Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc., p. 50-51 2 p. 1268513

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Polarization
Plasma enhanced chemical vapor deposition
Dielectric films
Amorphous carbon
Permittivity
2002

Electron cyclotron resonance-reactive ion etching of III-V semiconductors by cyclic injection of CH4/H2/Ar and O2

Haneji, N., Segami, G., Suzuki, T., Arakawa, T., Tada, K., Shimogaki, Y. & Nakano, Y. 2002 2002 International Microprocesses and Nanotechnology Conference, MNC 2002. Institute of Electrical and Electronics Engineers Inc., p. 70-71 2 p. 1178548

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Etching
Semiconductor materials
Electron cyclotron resonance
Reactive ion etching
Alumina