Research Center for Advanced JISSO Technology, Yokohama

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Silicon carbide Engineering & Materials Science
Powders Engineering & Materials Science
Sintering Engineering & Materials Science
Temperature Engineering & Materials Science
Gases Engineering & Materials Science
Nanocomposites Engineering & Materials Science
Etching Engineering & Materials Science
Spark plasma sintering Engineering & Materials Science

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Research Output 1991 2016

1 Citations

Analysis of sintering behavior of silicon nitride based on master sintering curve theory of liquid phase sintering

Tatami, J., Hiratsuka, D., Okada, S., Komeya, K. & Wakihara, T. 2016 Apr 1 In : Nippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan. 124, 4, p. 375-380 6 p.

Research output: Contribution to journalArticle

Sintering
Powders
Liquid phase sintering
Silicon nitride
Displacement measurement

Etching rate behavior of 4H-silicon carbide epitaxial film using chlorine trifluoride gas

Hirooka, A., Habuka, H. & Kato, T. 2016 Materials Science Forum. Trans Tech Publications Ltd, Vol. 858, p. 715-718 4 p. (Materials Science Forum; vol. 858)

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Silicon carbide
Epitaxial films
Chlorine
Etching
Substrates

Formation and removal of carbon film on silicon carbide surface using chlorine trifluoride gas

Hirooka, A., Habuka, H., Takahashi, Y. & Kato, T. 2016 In : ECS Journal of Solid State Science and Technology. 5, 7, p. P441-P445

Research output: Contribution to journalArticle

Carbon films
Silicon carbide
Etching
Chlorine
Gases